Method of removing undesired particles from a surface of a subst

Details Method of removing undesired particles from a surface of a subst Method of removing undesired particles from a surface of a subst

1987-07-21

1988-11-01

Pal, Asok

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 35, 134 42, B08B 304

Patent

active

047817640

ABSTRACT:
A method of removing articles having a diameter which is smaller than 0.3 .mu.m from a surface of a substrate, the method comprising moving an interface of the liquid over the surface of the substrate at a speed of up to 10 cm/sec. This is of great importance in the manufacture of integrated circuits with submicron details, in which contamination with such particles may have destructive consequences for the satisfactory operation of the circuit.

REFERENCES:
patent: 3664871 (1972-05-01), Fauker
patent: 4169807 (1979-10-01), Fuber
patent: 4178188 (1979-12-01), Dussault et al.
patent: 4238244 (1980-12-01), Banks
patent: 4375992 (1983-03-01), Stevens et al.
IBM Technical Disclosure Bull. 17 (2), Jul. 1974 p. 408.

Affiliated with

Also associated with

Rating

Method of removing undesired particles from a surface of a subst does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of removing undesired particles from a surface of a subst, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of removing undesired particles from a surface of a subst will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-889212