Polystyrenic stretched film and process for producing the polyst

Details Polystyrenic stretched film and process for producing the polyst Polystyrenic stretched film and process for producing the polyst

1996-07-16

1998-11-17

Nakarani, D. S.

Stock material or miscellaneous articles

Composite

Of addition polymer from unsaturated monomers

2641771, 26417717, 26417719, 428500, 428523, 428910, B29C 5512, B29C 7102, B29L 700, B29K 2500

Patent

active

058373845

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD

The present invention relates to a polystyrenic stretched film and a process for producing said film. More particularly, the present invention relates to a polystyrenic stretched film which is advantageously used as a base material for condenser films, FPC electric insulation films, photographic films, process films for printing, films for over-head projectors, packaging films, and the like, and a process for producing said film.


BACKGROUND ART

Styrenic polymers having the syndiotactic configuration have excellent mechanical properties, heat resistance, appearance, solvent resistance, and electric properties, and are expected to be used in various applications. Therefore, various technologies for extrusion of films, sheets, and fibers, various molded articles, and various applications have been proposed.
In the field of films, a material is frequently used for practical applications in the form of laminates, as a film treated with vapor deposition, or as a film having printing thereon. Therefore, it is necessary that a material has excellent properties for printing or vapor deposition. Stretched films having various physical properties which use the styrenic polymers having the syndiotactic configuration described above as a material, processes for producing stretched films, and various applications using the stretched films have been disclosed in Japanese Patent Application Laid-Open No. 182348/1989, Japanese Patent Application Laid-Open No. 182346/1989, Japanese Patent Application Laid-Open No. 67328/1990, Japanese Patent Application Laid-Open No. 143851/1990, Japanese Patent Application Laid-Open No. 74437/1991, Japanese Patent Application Laid-Open No. 86707/1991, Japanese Patent Application Laid-Open No. 124750/1991, Japanese Patent Application Laid-Open No. 131843/1991, Japanese Patent Application Laid-Open No. 261485/1992, Japanese Patent Application Laid-Open No. 200858/1993, Japanese Patent Application Laid-Open No. 57013/1994, Japanese Patent Application Laid-Open No. 57014/1994, Japanese Patent Application Laid-Open No. 57015/1994, Japanese Patent Application Laid-Open No. 57016/1994, Japanese Patent Application Laid-Open No. 57017/1994, Japanese Patent Application Laid-Open No. 64036/1994, Japanese Patent Application Laid-Open No. 64037/1994, Japanese Patent Application Laid-Open No. 65399/1994, Japanese Patent Application Laid-Open No. 65400/1994, Japanese Patent Application Laid-Open No. 65401/1994, Japanese Patent Application Laid-Open No. 65402/1994, Japanese Patent Application Laid-Open No. 80793/1994, Japanese Patent Application Laid-Open No. 91748/1994, Japanese Patent Application Laid-Open No. 91749/1994, Japanese Patent Application Laid-Open No. 91750/1994, Japanese Patent Application Laid-Open No. 99485/1994, Japanese Patent Application Laid-Open No. 100711/1994, Japanese Patent Application Laid-Open No. 106616/1994, Japanese Patent Application Laid-Open No. 107812/1994, Japanese Patent Application Laid-Open No. 107813/1994, Japanese Patent Application Laid-Open No. 114924/1994, and Japanese Patent Application Laid-Open No. 114925/1994.
However, films of conventional styrenic polymers having the syndiotactic configuration are not satisfactory with respect to the printing property including the setting property in the printing operation (adhesion of ink and the like) and other properties, such as peeling strength after vapor deposition. This causes problems when the films are used in various applications.


DISCLOSURE OF THE INVENTION

As the result of intensive studies made by the present inventors to solve the above problems, it has been found that a film having excellent properties, such as an excellent printing property and high peeling strength after vapor deposition, can be obtained when the content of residual monomers which are volatile components in the film and the content of foreign substances are decreased to or below specific values, and crystallinity is increased to or above a specific value. It has also been found by the present inventors that, even w

REFERENCES:
patent: 5286762 (1994-02-01), Funaki et al.
patent: 5373031 (1994-12-01), Funaki et al.
patent: 5518817 (1996-05-01), Yamasaki et al.

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