Apparatus for the plasma treatment of semiconductors

Details Apparatus for the plasma treatment of semiconductors Apparatus for the plasma treatment of semiconductors

1977-08-29

1979-11-20

Padgett, Benjamin R.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

156643, 156646, 204192E, 204192EC, 204298, 250527, 250531, 250542, B28D 506, H05H 124

Patent

active

041752350

ABSTRACT:
Apparatus for the plasma treatment of semiconductors comprises a plasma generating section, means for introducing a gas suitable for plasma treatment into the plasma generating section, high-frequency discharging means for activating the gas contained in said plasma generating section, a treatment section for treating semiconductor substrates with the activated gas, evacuation means for exhausting the gas, and discharge starting means positiioned in a region including the plasma generating section and its neighborhood, whereby a discharge can be started quickly and assuredly.

REFERENCES:
patent: 3485666 (1969-12-01), Sterling et al.
patent: 3501675 (1970-03-01), Cleaver et al.
patent: 3551312 (1970-12-01), Kahng et al.
patent: 4065369 (1977-12-01), Ogawa et al.

Affiliated with

Also associated with

Rating

Apparatus for the plasma treatment of semiconductors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for the plasma treatment of semiconductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for the plasma treatment of semiconductors will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-873972