Mask aligner with a wafer position detecting device

Details Mask aligner with a wafer position detecting device Mask aligner with a wafer position detecting device

1987-04-27

1988-12-27

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

356401, 358101, G06K 900

Patent

active

047946482

ABSTRACT:
A mask aligner includes a TV image pick-up device having a wide field angle and picking up the image of a wafer detection pattern on an image pick-up station to generate TV signals at the output, a fine alignment device for detecting a positional deviation of the wafer relative to a mask in an exposure station with the detected result being used to align the wafer with the mask, a transport stage for carrying and transporting the wafer from the image pick-up station to the exposure station, a processing device for determining the positional deviation of the wafer relative to the reference position on the image pick-up stage in accordance with the TV signals, and a drive for moving the transport stage so as to remove the positional deviation of the wafer relative to the reference position of the exposure station.

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patent: 4203132 (1980-05-01), Schmitt et al.
patent: 4251129 (1981-02-01), Suzki et al.
patent: 4275306 (1981-06-01), Kato et al.
patent: 4353087 (1982-10-01), Berry et al.
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patent: 4504148 (1985-03-01), Kuroki et al.
patent: 4521082 (1985-06-01), Suzoki et al.
patent: 4545684 (1985-10-01), Kuroki et al.
patent: 4553845 (1985-11-01), Kuroki et al.
patent: 4563094 (1986-01-01), Yamada
patent: 4595289 (1986-06-01), Feldman et al.

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