Clean room for manufacturing of semiconductor device

Details Clean room for manufacturing of semiconductor device Clean room for manufacturing of semiconductor device

1997-08-25

1999-07-27

Joyce, Harold

Ventilation

Clean room

414940, F24F 706

Patent

active

059280778

ABSTRACT:
There is provided a clean room for manufacturing of semiconductor device which has further enhanced the transferring capability responding to the request for short Turn Around Time. In this clean room for manufacturing of semiconductor device, a manufacturing facility comprising various manufacturing apparatuses and measuring apparatuses for manufacturing semiconductor device is arranged in the manufacturing space on the floor, the clean air is blown from the ceiling side of the manufacturing space, the air is then returned to the area under the floor via the ventilating aperture formed at the floor for circulating the air. The transfer route of the transferring system for transferring precursors of semiconductor device between each manufacturing facility is provided in the air returning area under the floor provided to return the air in the manufacturing space. Feeding of the precursors between the transferring system and manufacturing space can be executed through the aperture formed on the floor.

REFERENCES:
patent: 4826360 (1989-05-01), Iwasawa et al.
patent: 4923352 (1990-05-01), Tamura et al.
patent: 5058491 (1991-10-01), Wiemer et al.

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