Technique for removing impurities from a copper melt

Details Technique for removing impurities from a copper melt Technique for removing impurities from a copper melt

1985-04-29

1986-07-22

Rosenberg, Peter D.

Metallurgical apparatus

Means for melting or vaporizing metal or treating liquefied...

By means introducing treating material

75 53, 75 58, C21C 700

Patent

active

046014608

ABSTRACT:
A copper or copper alloy material having a reduced number of defects is formed by removing impurities from the material while in a molten state with a member having exposed silicon carbide particles. The member may be a bed filter formed from bed media having exposed silicon carbide particles, a porous body formed from a slurry containing silicon carbide, a porous body having at least one melt contacting surface coated with a silicon carbide material, and/or a lining having at least one melt contacting surface coated with a silicon carbide material.

REFERENCES:
patent: 2715063 (1951-09-01), Weiss
patent: 2863558 (1958-12-01), Brondyke et al.
patent: 3039864 (1962-06-01), Hess et al.
patent: 3051564 (1962-08-01), Drenning
patent: 3158465 (1964-11-01), Brown
patent: 3172757 (1965-03-01), Hess et al.
patent: 3175918 (1965-03-01), McGahan et al.
patent: 3704230 (1972-11-01), Loricchio
patent: 3769004 (1973-10-01), Barnhardt
patent: 3893917 (1975-07-01), Pryor et al.
patent: 3947363 (1976-03-01), Pryor et al.
patent: 3962081 (1976-06-01), Yarwood et al.
patent: 4007923 (1977-02-01), Chia
patent: 4022613 (1977-05-01), Haley
patent: 4024056 (1977-05-01), Yarwood et al.
patent: 4075303 (1978-02-01), Yarwood et al.
patent: 4257810 (1981-03-01), Narumiya
patent: 4258099 (1981-02-01), Narumiya
patent: 4265659 (1981-05-01), Blome
patent: 4277281 (1981-07-01), Weber et al.
patent: 4330327 (1982-05-01), Pryor
patent: 4342664 (1982-08-01), Blome
patent: 4343704 (1982-08-01), Brockmeyer
patent: 4426287 (1984-01-01), Narumiya

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