Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-06-17
1999-01-05
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430197, 4302811, 4302831, 4302881, 430906, G03F 7012, G03F 7037
Patent
active
058560599
ABSTRACT:
There are disclosed a photosensitive resin composition which comprises
(A) a polyamic acid having recurring units represented by the formula (I): ##STR1## represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.
REFERENCES:
patent: 4587197 (1986-05-01), Kojima et al.
patent: 4783391 (1988-11-01), Ohbayashi et al.
Hagiwara Hideo
Kaji Makoto
Nunomura Masataka
Chu John S.
Hitachi Chemical Co. Ltd.
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