Method for precision polishing non-planar, aspherical surfaces

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

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2041923, 20419232, 20419234, 427133, 427134, 427135, 427154, 427331, 4273763, 4273767, C23C 1418

Patent

active

058559663

ABSTRACT:
A method for precison polishing non-planar, aspherical surfaces in substrates, particularly surfaces of molding tool substrates for molding optical surfaces therewith, which is accomplished by coating the non-planar, aspherical surface with a layer of material having a melt temperature which is less than a temperature at which the substrate will distort, heating the layer of material coated on the non-planar, aspherical surface to at least the melt temperature thereby flowing the layer of material to yield a surface tension smooth surface superimposed over the non-planar, aspherical surface, and etching the surface tension smooth surface down into the substrate to completely remove the layer.

REFERENCES:
patent: 3804738 (1974-04-01), Lechaton et al.
patent: 5380349 (1995-01-01), Taniguchi et al.
LSI Surface Leveling by RF Sputter Etching, by Hom-ma et al, pp. 1531-1533.

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