Method and apparatus for measuring critical dimensions on a semi

Measuring and testing – Surface and cutting edge testing – Roughness

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G01B 514, G01B 714

Patent

active

060002816

ABSTRACT:
A combined atomic force microscope and stylus profilometer adapted to measure critical dimensions on a surface. The stylus profilometer is placed at a first position sufficiently near an edge of a first feature and the atomic force microscope subsequently measures the distance from this first position to the edge. The stylus profilometer is then positioned at a second position sufficiently near an edge of a second feature, measuring the distance from the first position to the second position. The atomic force microscope then measures the distance from the second position to the edge of the second feature.

REFERENCES:
patent: 5283442 (1994-02-01), Martin et al.
patent: 5321977 (1994-06-01), Clabes et al.
patent: 5450505 (1995-09-01), Keller
patent: 5528033 (1996-06-01), Lo et al.
patent: 5578745 (1996-11-01), Bayer et al.
patent: 5591903 (1997-01-01), Vesenka et al.
patent: 5621210 (1997-04-01), Lindsay
patent: 5665905 (1997-09-01), Bartha et al.
Griffith et al., "Dimensional Metrology of Phase-Shifting Masks with Scanning Probe Microscopes", SPIE vol. 2087 Photomask Technology and Management, 1993, pp. 107-118.
Griffith et al., "Dimensional Metrology with Scanning Probe Microscopes", J. Appl. Phys., vol. 74, No. 09, Nov. 1, 1993, pp. R83-R109.
Keller et al., "Envelope Reconstruction of Probe Microscope Images", Surface Science, vol. 294. 1993, pp. 409-419.
Markiewicz et al., "Atomic Force Microscopy Probe Tip Visualization Improvement of Images Using a Simple Deconvolution Procedure", Langmuir, vol. 10, No. 01, Jan. 21, 1994, pp. 5-7.
Martin et al., "Method for Imaging Sidewalls By Atomic Force Microscopy", Appl. Phys. Lett., vol. 64, No. 19, May 9, 1994, pp. 2498-2500.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for measuring critical dimensions on a semi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for measuring critical dimensions on a semi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring critical dimensions on a semi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-853952

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.