Continuous phase and amplitude holographic elements

Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430320, 430 2, 430942, 430296, 25049222, 2504923, 359565, 359569, G03C 500, G03H 500

Patent

active

053936345

ABSTRACT:
A method for producing a phase hologram using e-beam lithography provides n-ary levels of phase and amplitude by first producing an amplitude hologram on a transparent substrate by e-beam exposure of a resist over a film of metal by exposing n.ltoreq.m.times.m spots of an array of spots for each pixel, where the spots are randomly selected in proportion to the amplitude assigned to each pixel, and then after developing and etching the metal film producing a phase hologram by e-beam lithography using a low contrast resist, such as PMMA, and n-ary levels of low doses less than approximately 200 .mu.C/cm.sup.2 and preferably in the range of 20-200 .mu.C/cm.sup.2, and aggressive development using pure acetone for an empirically determined time (about 6 sec.) controlled to within 1/10 sec. to produce partial development of each pixel in proportion to the n-ary level of dose assigned to it.

REFERENCES:
patent: 4051271 (1977-09-01), Fujishige
patent: 4360585 (1982-11-01), Frank et al.
patent: 4772539 (1988-09-01), Gillespie
patent: 4797334 (1989-01-01), Glendinning
patent: 4895790 (1990-01-01), Swanson et al.
patent: 5051598 (1991-09-01), Ashton et al.
patent: 5057397 (1991-10-01), Miyabe et al.
patent: 5104772 (1992-04-01), Kobayashi et al.
patent: 5112724 (1992-05-01), Bradshaw
patent: 5241185 (1993-08-01), Meiri et al.
Ekberg et al, Appl. Opt. 15 568-569 (May 1990).
Fujita et al, Appl. Opt. 6 613-615 (Dec. 1981).
Fujita et al, Appl. Opt. 7 578-580 (Dec. 1982).
Mihir Parikh, "Corrections to proximity effects in electron beam lithography," J. Appl. Phys. 50 (6), Jun. 1979, pp. 4371-4377.
"Proximity effect correction for electron beam Lithography by equalization of background dose" by Geraint Owen and Paul Rissman, J. App. Physics 54 (6), Jun. 1983, pp. 3573-3581.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Continuous phase and amplitude holographic elements does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Continuous phase and amplitude holographic elements, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Continuous phase and amplitude holographic elements will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-847657

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.