Method and apparatus for patterning encapsulated liquid crystal

Details Method and apparatus for patterning encapsulated liquid crystal Method and apparatus for patterning encapsulated liquid crystal

1996-07-24

1998-10-06

Sikes, William L.

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

349187, G02F 1137, G02F 11339

Patent

active

058185569

ABSTRACT:
An encapsulated liquid crystal layer is patterned by placing a mask into contact with a coated substrate. The mask is held against the substrate, for example, by a vacuum, to form a seal. The assembly is submerged in a solvent to dissolve the exposed region of the encapsulated liquid crystal material.

REFERENCES:
patent: 4182700 (1980-01-01), Benton et al.
patent: 4435047 (1984-03-01), Fergason
patent: 4669828 (1987-06-01), Parker
patent: 4685771 (1987-08-01), West et al.
patent: 5056898 (1991-10-01), Ma et al.
patent: 5328580 (1994-07-01), Reamey
patent: 5430563 (1995-07-01), Bouteiller et al.
Patent Abstracts of Japan vol. 012, No. 006 (P-653), 9 Jan. 1988 (abstract of JP 62-165622 (Seiko Epson)).
Patent Abstracts of Japan, vol. 009, No. 214 (P-384), 31 Aug. 1985 (abstract of JP 60-075817 (Sharp)).
WPI Abstract No. 94-077543/10 (abstract of JP 06027447 (Feb. 1994)).

Affiliated with

Also associated with

Rating

Method and apparatus for patterning encapsulated liquid crystal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for patterning encapsulated liquid crystal , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for patterning encapsulated liquid crystal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-84703