Polishing apparatus

Details Polishing apparatus Polishing apparatus

1997-05-29

1999-08-03

Rose, Robert A.

Abrading

Machine

Rotary tool

451286, 451287, 451288, 451289, 454187, B24B 100

Patent

active

059317230

ABSTRACT:
A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus has an exhaust device for exhausting air in the polishing apparatus. The polishing apparatus includes a housing, a polishing section housed in the housing for polishing a workpiece, a cleaning section housed in the housing for cleaning the workpiece which has been polished, and a base comprising a plurality of structural members for supporting at least one device in at least one of the cleaning section and the polishing section. At least one of the structural members has a fluid passage therein and intake openings to serve as an exhaust duct. The polishing apparatus further comprises a main exhaust duct communicating with the exhaust duct and extending to an exterior of the housing for exhausting air introduced in the exhaust duct.

REFERENCES:
patent: 2935820 (1960-05-01), Mead
patent: 3863392 (1975-02-01), Haker
patent: 4838150 (1989-06-01), Suzuki et al.
patent: 5138807 (1992-08-01), Daw et al.
patent: 5144781 (1992-09-01), Fitzner
patent: 5299584 (1994-04-01), Miyazaki et al.
patent: 5522767 (1996-06-01), Bertsche et al.
patent: 5679059 (1997-10-01), Nishi et al.

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