Process for forming deposited film

Details Process for forming deposited film Process for forming deposited film

1986-02-06

1988-01-05

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 531, 437233, B05D 306

Patent

active

047175850

ABSTRACT:
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, and then allowing both the species to react with each other thereby to form a deposited film on the substrate.

REFERENCES:
patent: 3825439 (1974-07-01), Tick
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4220488 (1980-09-01), Duchemin et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4461783 (1984-07-01), Yamazaki
patent: 4521447 (1985-06-01), Ovshinsky et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4569697 (1986-02-01), Tsu et al.
patent: 4582560 (1986-04-01), Sanjurjo

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