Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1976-10-28
1978-12-12
Daus, Donald G.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
26032636, 2603265FL, 2603265S, C07D20726, A01N 922
Patent
active
041295730
ABSTRACT:
This invention is directed to compositions for influencing plant growth, especially weed control, growth inhibition and desiccation, containing as active ingredient a 1-phenyl-2-oxo-pyrrolidine-4-carboxylic acid derivative of formula ##STR1## wherein A is --OH, --OR.sub.1, --SR.sub.2 or --CN, R.sub.1 representing a cation or an ester moiety, R.sub.2 an alkyl, benzyl or phenyl group, X being a substituent chosen from alkyl, alkoxy, alkylthio, phenoxy, substituted sulfamoyl or substituted sulfonylamino, Y is hydrogen, halogen, CF.sub.3, alkyl, alkylthio or alkoxy and Z is hydrogen, alkyl, alkylthio or alkoxy.
The invention is also concerned with novel compounds of this formula, wherein Y is alkyl, alkylthio, halogen or CF.sub.3.
REFERENCES:
patent: 2757125 (1956-07-01), Mudrah
patent: 2811496 (1957-10-01), Knuth
patent: 3136620 (1964-06-01), Bucha et al.
patent: 3149954 (1964-09-01), Harrod
patent: 3238223 (1966-03-01), Wilson et al.
patent: 3306909 (1967-02-01), Uloth
patent: 3637746 (1972-01-01), Wei et al.
patent: 3813387 (1974-05-01), Pfirrmann et al.
patent: 4013445 (1977-03-01), Bellus et al.
patent: 4064264 (1977-12-01), Nelson
Pesson et al., Chem. Abs., vol. 74:87731p, (1971).
Bellus Daniel
Fory Werner
Tobler Hans
Ciba-Geigy Corporation
Daus Donald G.
Falber Harry
Lee Mary C.
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