Process for removing hydrogen sulphide from gas streams

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component

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Details

423226, 423232, 4235765, 4235767, C01B 1716, C01B 3120, C01B 1702

Patent

active

049216821

ABSTRACT:
Processes for the removal of hydrogen sulphide from gas streams and for the regeneration of spent scrubbing liquor used in an absorber to remove hydrogen sulphide from a gas stream, are disclosed. In the former process, hydrogen sulphide is removed by five-valent oxovanadium which is simultaneously reduced to its four-valent state, the precipitation of which is prevented by having a sufficiently high concentration of total alkalinity present in the scrubbing solution. In the latter process the four-valent oxovanadium is oxidized to its five-valent state, preferably by an oxygen-containing gas, and a suffficently high concentration of total alkalinity is provided in the scrubbing liquor to yield a desired re-oxidation rate of the four-valent oxovanadium.

REFERENCES:
patent: 4206194 (1980-06-01), Fenton et al.
patent: 4243648 (1981-01-01), Fenton
patent: 4283379 (1981-08-01), Fenton et al.
patent: 4434143 (1984-02-01), Weber
patent: 4434145 (1984-02-01), Weber
patent: 4434146 (1984-02-01), Weber
patent: 4526773 (1985-07-01), Weber
patent: 4541998 (1985-09-01), Weber

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