Silicon network polymers

Details Silicon network polymers Silicon network polymers

1989-04-27

1990-05-01

Sikes, William L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

350 9634, 528 33, G02B 610

Patent

active

049213210

ABSTRACT:
A new class of silicon compounds having a high percentage of silicon atoms bonded to three other silicon atoms has been synthesized. These materials denominated polysilynes form smooth amorphous films which have quite useful properties. For example, photooxidation produces a refractive index change from 1.70 to 1.45. Similarly, photooxidation also produces a substantial change in solubility. Thus the materials are useful for the fabrication of optical and electronic devices.

REFERENCES:
West; "Journal of Organometallic Chemistry"; vol. 300, pp. 327-346; 1986.
Miller, R. D., Materials for Microlithography: Radiation Sensitive Polymers, American Chemical Society, Washington, D.C. 1984.
West R. and Indriksons, A., Journal of the American Chemical Society, 94, 6110 (1972).
Seyferth, D. and Yu, Y.-F., Design of New Materials, D. L. Cocke and A. Clearfield Eds., Plenum Publishing, 1986.
Integrated Optical Circuits and Components, Lynn Hutchinson, Ed. 1987, Marcel Dekker, Inc., New York.
Mucha, J. A. and Hess, D. W., Introduction to Microlithography, L. F. Thompson, Ed., American Chemical Society Symposium Series, No. 219, 1983.
Verbeek, B. H., et al., Journal of Lightwave Technology, 6, 1011 (1988).
Okomura, Y., et al., Applied Optics, 22, 3892, (1983).

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