Method for processing semiconductor materials

Details Method for processing semiconductor materials Method for processing semiconductor materials

1989-05-04

1992-01-07

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

148DIG45, 148DIG71, 437189, 437247, 437936, 437942, 427 531, H01L 2126, H01L 21268

Patent

active

050791877

ABSTRACT:
A method for processing semiconductor material for annealing or circuitizing purposes, includes establishing a high intensity light which is controlled at a high repetition rate, and exposing it toward the surface of the semiconductor material to process it in an improved manner. The high speed light is directed transversely to the surface of the material to be processed, only to a shallow depth.

REFERENCES:
patent: 4007430 (1977-02-01), Fletcher et al.
patent: 4088966 (1978-05-01), Samis
patent: 4151008 (1979-04-01), Kirkpatrick
patent: 4331485 (1982-05-01), Gat
patent: 4367514 (1983-01-01), Silfvast et al.
patent: 4450568 (1984-05-01), Asmus
patent: 4454835 (1984-06-01), Walsh et al.
patent: 4522657 (1985-06-01), Rohatgi et al.
patent: 4525381 (1985-06-01), Tanaka et al.
patent: 4525382 (1985-06-01), Sugioka
patent: 4624736 (1986-11-01), Gee et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4641316 (1987-02-01), Collins et al.
patent: 4718974 (1988-01-01), Minaee
patent: 4751193 (1988-06-01), Myrick

Affiliated with

Also associated with

Rating

Method for processing semiconductor materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for processing semiconductor materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for processing semiconductor materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-822147