Mask for exposing flexographic plates

Details Mask for exposing flexographic plates Mask for exposing flexographic plates

1998-01-06

1999-12-07

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430302, G03F 900

Patent

active

059980672

ABSTRACT:
A mask for exposing flexographic plates contains, besides the standard binary image, areas shaded with a partially light absorbing layer. This partial light absorbance changes the exposure in certain areas and optimizes exposure separately for each different part of the image. The mask can be a separate film or integral to the plate. The required absorbance can be automatically computed when the mask is being generated. The invention is particularly useful with thermal films, as thermal films do not have to trade off edge sharpness and gray levels.

REFERENCES:
patent: 5213916 (1993-05-01), Cronin et al.
patent: 5262275 (1993-11-01), Fan
patent: 5304441 (1994-04-01), Samvelo et al.
patent: 5725972 (1998-03-01), Takeshita
Optical Proximity Effects--Mirolithography World., Spring. 1996. pp. 22-23., C. Mack.

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