Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1989-12-14
1992-01-07
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 31, G03F 900
Patent
active
050791133
ABSTRACT:
A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
REFERENCES:
patent: 4544443 (1985-10-01), Ohta et al.
Hirokane Junji
Inui Tetsuya
Mieda Michinobu
Nagahara Yoshiyuki
Ohta Kenji
Bowers Jr. Charles L.
Neville Thomas R.
Sharp Kabushiki Kaisha
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