Process for producing a deposit comprising silica on the surface

Details Process for producing a deposit comprising silica on the surface Process for producing a deposit comprising silica on the surface

1994-11-28

1999-12-07

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

42725518, 42725537, 4272555, C23C 1622

Patent

active

059979488

ABSTRACT:
A deposit of a silica base layer is formed on the surface of a glass product by projecting on a hot surface of the product, in a non confined ambient atmosphere, a gaseous mixture having a silane content lower than 2%, an oxygen content between 3.5 and 30%, and advantageously a hydrogen content lower than 5%. The surface of the object to be treated is advantageously heated immediately before being sent to the injection station.

REFERENCES:
patent: 3681132 (1972-08-01), Pammer et al.
patent: 4105810 (1978-08-01), Yamazaki et al.
patent: 4485146 (1984-11-01), Mizuhashi et al.

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