Liquid treatment process

Details Liquid treatment process Liquid treatment process

1988-08-05

1989-11-07

Locker, Howard J.

Chemistry: electrical and wave energy

Processes and products

252631, 210682, 210748, 423 2, 423 6, 423 22, 204109, C25C 122, C25C 334, C25D 354, C25D 532

Patent

active

048790060

ABSTRACT:
Ruthenium in aqueous solution in a first, oxidizable oxidation state (e.g. as RuNO(NO.sub.3).sub.3) is converted to an insoluble form in a second, different oxidation state (e.g. as RuO.sub.2.nH.sub.2 O) by establishing an electrochemical cell wherein the solution is the electrolyte and electrochemically oxidizing and reducing the ruthenium in the cell. The insoluble form may be filtered from the liquid. The ruthenium treatment may be a stage in the removal of radioactive species from liquids such is in the treatment of medium and low level activity liquid waste streams, wherein actinides are precipitated and filtered off either before or after ruthenium treatment. Subsequently, residual activity may be removed from the stream by either or both of (a) absorption, followed by filtration and electro-osmotic dewatering and (b) electrochemical ion exchange. Filtration fluxes may be maintained by direct electrochemical membrane cleaning.

REFERENCES:
patent: 3616275 (1969-04-01), Schneider et al.
patent: 3891741 (1975-06-01), Carlin et al.
patent: 3922231 (1975-11-01), Carlin et al.
patent: 4021313 (1977-05-01), Hausberger et al.
patent: 4069293 (1978-01-01), Tallent
patent: 4129481 (1978-12-01), Aubert et al.
patent: 4316776 (1982-02-01), Tallent et al.
patent: 4341602 (1982-07-01), Nenner et al.
patent: 4371505 (1983-02-01), Pautrot

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