1985-02-26
1987-12-22
Arnold, Bruce Y.
350166, G02B 528
Patent
active
047143088
ABSTRACT:
An ultraviolet reflecting mirror comprises a substrate, a high reflection factor film provided on the substrate and having a film thickness of at least 250 .ANG. and reflecting a light beam by the surface thereof, and a group of dielectric material layers comprising one or more sets of two layers of low refractive index film and high refractive index film provided on the high reflection factor film. The low refractive index film is provided on the high reflection factor film. The optical film thickness of the high refractive index film and the low refractive index film is approximately 1/4(2n-1).lambda., where n is a natural number and .lambda. is the design wavelength and 150nm.ltoreq..lambda..ltoreq.300nm. The film thickness of at least one of the high refractive index film and the low refractive index film is 3.lambda./4.
REFERENCES:
patent: 3851973 (1974-12-01), Mjcek
patent: 4320936 (1982-03-01), Sawamura
Sawamura Mitsuharu
Taniguchi Yasushi
Arnold Bruce Y.
Canon Kabushiki Kaisha
LandOfFree
Ultraviolet reflecting mirror does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ultraviolet reflecting mirror, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ultraviolet reflecting mirror will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-815672