Method for fabricating a multistage phase shift mask

Details Method for fabricating a multistage phase shift mask Method for fabricating a multistage phase shift mask

1995-05-17

1999-03-16

Codd, Bernard

Etching a substrate: processes

Forming or treating mask used for its nonetching function

430 5, G03F 100

Patent

active

058825347

ABSTRACT:
A multistage phase shift mask includes a light transmissive substrate having light shielding regions and light transmissive regions. A shielding layer is disposed on the shielding regions of the substrate and a phase shifter layer extends over the light transmissive regions between a pair of the shielding regions. A first etched portion on the substrate is adjacent to the phase shifter layer that contacts with the substrate and a second etched portion on the substrate is between the phase shifter layer and the first etched portion of the substrate.
The second etched portion consists of a gradual concave slope allowing a phase shift from approximately 0 to 180 degrees.

REFERENCES:
patent: 5288568 (1994-02-01), Cathey, Jr.
patent: 5403682 (1995-04-01), Lin
patent: 5437947 (1995-08-01), Hur et al.
patent: 5487962 (1996-01-01), Rolfson
Hisashi Watanabe, Yoshihiro Todokoro, Yoshihiko Hirai and Morio Inoue, "Transparent phase shifting mask with multistage phase shifter and comb-shaped shifter", SPIE vol. 1463 Optical/Laser Micro-lithography IV (1991), pp. 101-110.

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