X-ray source

Details X-ray source X-ray source

1986-04-29

1988-09-13

Church, Craig E.

X-ray or gamma ray systems or devices

Source

378 34, 378122, 2504922, H05H 134

Patent

active

047714476

ABSTRACT:
In a gas injection type plasma X-ray source, a through hole communicated with vacuum is provided in each one of a pair of plasma-forming electrodes. This leads to a decrease in the dose of charged particles, a high temperature gas, etc. reflected from the upper electrode and inflicting damage on an X-ray extraction window. Accordingly, the thickness of the X-ray extraction window can be so decreased as to raise the X-ray extraction efficiency. Besides, evacuation of a space between the electrodes can be quickened. Accordingly, X-ray emission can be effected at a high repetition frequency. When the normal line direction of the electrode is inclined relative to the direction of the X-ray extraction, the effects mentioned above are enhanced.

REFERENCES:
patent: 2379397 (1945-06-01), Zunick
patent: 4494043 (1984-01-01), Stallings et al.
patent: 4635282 (1986-01-01), Okada et al.
patent: 4644576 (1987-02-01), Kuyel
Article by C. Stallings et al; Imploding Argon Plasma Experiments, Appl. Phys. Lett., 35(7), Oct. 1st, 1979, pp. 524-526.
Article by J. S. Pearlman et al; X-ray Lithography Using a Pulsed Source; J. Vac. Sci. Technol., 19(4), Nov./Dec. 1981, pp. 1190-1193.
Article by J. Bailey; Evaluation of the Gas Puff Z Pinch as an X-ray Lithography Microscopy Source; Appl. Phys. Lett., 40(1), Jan. 1, 1982, pp. 33-35.

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