Fluid flow control method and apparatus for minimizing particle

Details Fluid flow control method and apparatus for minimizing particle Fluid flow control method and apparatus for minimizing particle

1989-03-03

1991-01-29

Recla, Henry J.

Fluent material handling, with receiver or receiver coacting mea

Processes

Gas or variation of gaseous condition in receiver

141 66, 137 14, 1374875, 2504411, 2504923, G05D 1600, F16K 2404

Patent

active

049879332

ABSTRACT:
A fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminants from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber by cyclicly pressurized and depressurized.

REFERENCES:
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patent: 4717829 (1988-01-01), Turner
patent: 4739787 (1988-04-01), Stoltenberg
patent: 4836233 (1989-06-01), Milgate, III
Ashrae Handbook--1981 Fundamentals, Pub. by the American Society of Heating, Refrigerating and Air-Conditioning Engineers, Inc., 1981, pp. 33.27-33.30.

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