Method for fabricating and annealing an electrophotographic imag

Details Method for fabricating and annealing an electrophotographic imag Method for fabricating and annealing an electrophotographic imag

1983-07-08

1984-09-18

Martin, Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

430128, 430133, 430136, 430 57, 427 39, 204192P, 357 2, G03G 5082

Patent

active

044724926

ABSTRACT:
A method for fabricating an electrophotographic image forming member, wherein the first photoconductive layer consisting of an amorphous inorganic semiconductive material is formed on a substrate suited for the electrophotographic process, then the second photoconductive layer, which is different from the first photoconductive layer and consists of amorphous silicon containing therein silicon as the matrix and at least one of hydrogen and halogen atoms, is formed on the first photoconductive layer, and thereafter, the second photoconductive layer is annealed by irradiating a laser beam on the surface of the second photoconductive layer.

REFERENCES:
patent: 4049461 (1977-10-01), Fan et al.
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4225222 (1980-09-01), Kempter
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4265991 (1981-05-01), Hirai
patent: 4289822 (1981-09-01), Shimada et al.

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