Processing apparatus and method

Details Processing apparatus and method Processing apparatus and method

1987-07-16

1990-03-20

Bueker, Richard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 541, 427 531, 118722, 118723, 437241, C23C 1650

Patent

active

049100432

ABSTRACT:
A processing apparatus and method utilizing a single process chamber for deposition of silicon nitride with a silicon source, a remote plasma including a nitrogen source, additional ultraviolet energy coupled into the process chamber to provide additional molecular excitation of the silicon source.

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