Semiconductor device having various threshold voltages and manuf

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437 27, 437 34, 437 45, 437 56, 437 57, H01L 218238

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active

055808050

ABSTRACT:
An impurity for adjusting a threshold voltage is ion-implanted using, as masks, a resist for forming P.sup.- -type diffusion layers, a resist for forming N.sup.+ -type diffusion layers and N-type diffusion layers and a resist for forming P.sup.+ -type diffusion layers and N-type diffusion layers. For this reason, a semiconductor device including first to third N-channel transistors and first and second P-channel transistors, all of which respectively have different threshold voltages, can be manufactured without using an additional resist except for the above resists. Therefore, an operating margin at a low voltage can be improved and data retention characteristics can be improved in a memory without causing an increase in cost, an increase in power consumption and the like.

REFERENCES:
patent: 4753898 (1988-06-01), Parrillo et al.
patent: 4845047 (1989-06-01), Holloway et al.

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