Polishing pad with controlled abrasion rate

Details Polishing pad with controlled abrasion rate Polishing pad with controlled abrasion rate

1991-10-09

1994-03-29

Rachuba, M.

Abrasive tool making process, material, or composition

Impregnating or coating an abrasive tool

51209DL, 511313, 51395, 51DIG34, B24D 300

Patent

active

052973646

ABSTRACT:
A polishing pad is provided, having its face shaped to produce controlled nonuniform removal of material from a workpiece. Non-uniformity is produced as a function of distance from the pad's rotational axis (the working radius). The pad face is configured with both raised, contact regions and voided, non-contact regions such that arcuate abrasive contact varies nonuniformly as a function of distance from the pad's rotational axis. Void density at any distance may be produced by several techniques such as varying void size as a function of working radius or varying the number of voids per unit area as a function of working radius. Either technique produces variation in voided area per total unit area for rings of pad surface concentric with the rotational axis having infintesimally small width.

REFERENCES:
patent: 816461 (1906-03-01), Gorton
patent: 959054 (1910-05-01), Glover
patent: 3468079 (1969-09-01), Kaufman
patent: 4821461 (1989-04-01), Holmstrand

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