Method and apparatus for chemical coating on opposite surfaces o

Details Method and apparatus for chemical coating on opposite surfaces o Method and apparatus for chemical coating on opposite surfaces o

1995-04-03

1996-12-03

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118728, 118731, 118730, C23C 1600

Patent

active

055803849

ABSTRACT:
A PECVD coating apparatus includes a vacuum coating chamber for performing a PECVD process. At least one pair of spaced apart electrodes is positioned within the chamber and powered by an electric power supply generator to produce a plasma discharge generating voltage between the electrodes. Gas is fed between the electrodes in the chamber for producing a plasma discharge reaction that, in turn, forms a coating reaction product. A holding member is placed in the chamber for positioning one or more workpieces with their opposite surfaces at equally spaced positions from each of the electrodes of the pair of electrodes. The workpieces are electrically isolated from the chamber through the holding member so that a free floating electrical potential is maintained on the workpieces. As a result, the opposite surfaces of the workpieces are substantially identically coated in the chamber using the PECVD process.

REFERENCES:
patent: 3730696 (1973-05-01), Pointa et al.
patent: 3996884 (1976-12-01), Horiguchi
patent: 4289598 (1981-09-01), Engle
patent: 4512284 (1985-04-01), Robinson et al.
patent: 4616597 (1986-10-01), Kaganowicz
patent: 4991542 (1991-02-01), Kohmura
patent: 5370737 (1994-12-01), Mathis
Wydeven et al, "Antireflection Coating Prepared by plasma polymerization of perfluorobutene-2", Applied Optics, vol. 15, No. 1, Jan. 1976, pp. 132-136 .

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