Process for formation of base and light-sensitive material

Details Process for formation of base and light-sensitive material Process for formation of base and light-sensitive material

1987-08-13

1990-11-13

Gerstl, Robert

Organic compounds -- part of the class 532-570 series

Organic compounds

Unsubstituted hydrocarbyl chain between the ring and the -c-...

544242, 544282, 544330, 544352, 544358, 546152, 546186, 546242, 546244, 546304, 546311, 546348, 548199, 548315, 548323, 548335, 548347, 564225, 564240, 564241, 564391, 564462, 564463, 564503, 564506, C07C 6952, C07C 6976, C07D21355, G03C 524

Patent

active

049703072

ABSTRACT:
A process for formation of a base from a base precursor, which comprises decomposing the base precursor in the presence of a catalyst. The base precursor has the following formula (I) or (II):

REFERENCES:
patent: 4560763 (1985-12-01), Sato
Toussaint, Tetrahedron, 40 3229 (1984).
Miyashita et al., Ag Bio. Chem. 45, 2521 (1981).
Chemical Abstracts 135390v, vol. 81, 1974 Entitled "Catalytic Decarboxylation of .alpha.-Acetylenic Acids", (Akopyan).
Chemical Abstracts 135032s, vol. 84, 1976 Entitled "Reaction of .alpha.-Acetylenic Acids in the Presence of Copper Salts," (Akopyan).
March Advanced Organic Chemistry, p. 562, (1985).
Akopyan, J. of Gen Chem. USSR, 44 (8)1804 (1974).

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