Optical: systems and elements – Having significant infrared or ultraviolet property – Lens – lens system or component
Patent
1998-02-20
1999-10-26
Phan, James
Optical: systems and elements
Having significant infrared or ultraviolet property
Lens, lens system or component
359205, 359208, 359729, 359731, G02B 1314
Patent
active
059738260
ABSTRACT:
An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.
REFERENCES:
patent: 5063586 (1991-11-01), Jewell et al.
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5212588 (1993-05-01), Viswanathan et al.
patent: 5220590 (1993-06-01), Bruning et al.
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5410434 (1995-04-01), Shafer
"Design of reflective relay for soft x-ray lithography" by Rodgers et al.; SPIE vol. 1354, International Lens Design Conference (1990).
"Reflective systems design study for soft x-ray projection lithography" by Jewell et al.; J. Vac. Sci. Technol. B 8 (6) Nov./Dec. 1990.
"Optical system design issues in development of projection camera for EUV lithography" by Jewell; SPIE vol. 2437 May 1995.
"Ring-field EUVL camera with large etendu" by W.C. Sweatt, Sandia National Laboratories, (1996).
Chapman Henry N.
Hudyma Russell M.
Shafer David R.
Sweeney Donald W.
Grzybicki Daryl S.
Phan James
Regents of the University of California
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