Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1989-03-03
1990-10-23
Goodrow, John L.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430128, G03G 514
Patent
active
049651560
ABSTRACT:
The disclosure discloses a photosensitive member comprising an electrically conductive substrate, an organic photoconductive layer comprising an organic material as a matrix, and an overcoat layer comprising an amorphous carbon as a matrix and formed on said organic photoconductive layer. Said overcoat layer comprises a first overcoat layer containing fluorine atoms in an amount of about 5 atomic % or more and a second overcoat layer formed on said first overcoat layer and containing fluorine atoms in an amount of less than about 5 atomic %. Said overcoat layer has a thickness of about 0.01 to about 4.0 microns and said second overcoat layer has a thickness of about 10 to about 400 angstroms.
The disclosure also discloses a process for manufacturing the above-mentioned photosensitive member.
REFERENCES:
patent: 4544617 (1985-10-01), Mort et al.
patent: 4634648 (1987-01-01), Jansen et al.
patent: 4664999 (1987-05-01), Kakinuma et al.
patent: 4713309 (1987-12-01), Johncock et al.
patent: 4755444 (1988-07-01), Karakida et al.
"Properties of Diamond-Like Carbon Films", Thin Solid Films, vol. 119, pp. 121-126, 1984.
"Electronic Properties of Substitutionally Doped Amorphous Si and Ge", Philosophical Magazine, vol. 33, No. 6, pp. 935-949, 1976.
"Photosensitive Materials for Electron Photography--OPC vs. Inorganics", Nikkei New Materials, Dec. 15, 1986.
"A Review of Recent Advances in Plasma Engineering", Review of Recent Advances, Mar. 29, 1979.
Doi Isao
Fujiwara Masanori
Hotomi Hideo
Iino Shuji
Masaki Kenji
Goodrow John L.
Minolta Camera Kabushiki Kaisha
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