Negative type lithographic printing plate

Details Negative type lithographic printing plate Negative type lithographic printing plate

1991-04-10

1997-06-10

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430158, 430160, 430175, 430176, 430302, G03F 7021

Patent

active

056374356

ABSTRACT:
A negative-type photosensitive lithographic printing plate having a photosensitive layer comprising upper and lower layers, each layer containing a photosensitive diazo resin, on a support having a hydrophilic surface. The concentration of the diazo resin in the upper layer is not more than 1/3 of the concentration of the diazo resin in the lower layer, the thickness of the upper layer is not less than three times the thickness of the lower layer, and the upper layer contains an oleophilic non-photosensitive resin with a weight average molecular weight ranging from 10,000 to 150,000. The lithographic printing plate has a very short exposure time, may be used with projection exposure systems and allows for the use of known developers and automated developer systems.

REFERENCES:
patent: 3479182 (1969-11-01), Chu
patent: 4104072 (1978-08-01), Golda et al.
patent: 4588669 (1986-05-01), Asano
patent: 4612276 (1986-09-01), Browne
patent: 4687727 (1987-08-01), Toyama et al.
patent: 4886731 (1989-12-01), Sypek et al.
patent: 4956261 (1990-09-01), Pawlowski et al.

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