Plasma cleaning device for substrate

Details Plasma cleaning device for substrate Plasma cleaning device for substrate

1998-02-06

1999-10-26

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

H05H 100

Patent

active

059721634

ABSTRACT:
In a plasma cleaning device for a substrate, a vacuum chamber is arranged on a base board and made up of a lid which is opened and closed when necessary, and an electrode to which a high frequency power supply applies high frequency voltage includes an upper electrode, a middle electrode, and a lower electrode. The upper electrode is inside the vacuum chamber, and serves as a means for laying a substrate to be plasma-cleaned. The upper electrode has protrusions for guiding a substrate which is conveyed. In the device, the substrate which has been plasma is slid on the upper electrode while being guided by the protrusions, thus being conveyed to a wire bonding unit. When a kind of substrate is changed to another one, only the upper electrode is replaced with another one which corresponds in size to the new substrate.

REFERENCES:
patent: 4891087 (1990-01-01), Davis et al.

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