Method for detecting positions of photomask and substrate

Details Method for detecting positions of photomask and substrate Method for detecting positions of photomask and substrate

1993-01-29

1995-07-04

Mai, Ngoclan

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 378 35, 2504911, 355 53, 355 77, G03F 900

Patent

active

H00014630

ABSTRACT:
A photomask having a pattern area having plurality of patterns to be transferred onto a transfer member generally regularly arranged thereon comprises a non-pattern area of a size no smaller than a size of at least one said pattern and provided at a predetermined position in said pattern area.

REFERENCES:
patent: 4642672 (1987-02-01), Kitakata
patent: 4835078 (1989-05-01), Harvey et al.
patent: 4849901 (1989-07-01), Shimizu
patent: 5087537 (1992-02-01), Conway et al.

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