Preparation of 2-haloethylamides

Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal

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548229, 260455A, 260959, 560 30, 560161, 564 55, 564 90, 564 95, 564 98, 564106, 564156, 564183, 564209, C07C11800, C07C10200

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active

045058598

ABSTRACT:
2-Haloethylamides are prepared by reaction of 2-oxazolidinone or C.sub.1-6 alkyl or phenyl derivatives thereof with an acid halide.

REFERENCES:
patent: 2303177 (1942-11-01), Schlack
patent: 2399118 (1946-04-01), Homeyer
patent: 2617825 (1952-11-01), Wood
patent: 3052669 (1962-09-01), Gavlin et al.
patent: 3108115 (1963-10-01), Little et al.
patent: 3133932 (1964-05-01), Horn et al.
patent: 3152147 (1964-10-01), Vargha et al.
patent: 3193559 (1965-07-01), Regnier et al.
patent: 3221021 (1965-11-01), Hickner
patent: 3404172 (1968-10-01), Tomalia
patent: 3449396 (1969-06-01), Tomalia
patent: 4097262 (1978-06-01), Cheng
patent: 4416818 (1983-11-01), Poindexter
Mundy et al., J. Heterocyclic Chem., 19, (1982), pp. 1221-1222.
C.A., 80, (1974), 59459m, Tanaka et al.
Degering, "An Outline of Organic Nitrogen Compounds", 1945, Univ. Lithoprinters, Ypsilanti, Michigan, pp. 397, 398 and 415.
Oda et al., B.C.S., Japan, (1962), 35, pp. 1910-1914 and 1915-1920.
Oda et al., C.A. 59, (1963), 3909h.
Herbert Bestian, Justus Liebigs Ann Chem. 566, 210-244, (1950).
Artur Seher, Justus Liebigs Ann Chem. 575, 153-161, (1952).
W. Marckwald et al., Berichte, 34, 3544-3558, (1901).

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