Photosensitive member with an amorphous silicon-containing insul

Details Photosensitive member with an amorphous silicon-containing insul Photosensitive member with an amorphous silicon-containing insul

1984-09-10

1987-04-21

Goodrow, John L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 67, 430 85, G03G 5082

Patent

active

046596399

ABSTRACT:
A photosensitive member which comprises a photoconductive layer and an insulating layer located on the photoconductive layer, the photoconductive layer including amorphous silicon and the insulating layer including amorphous silicon, carbon, oxygen and fluorine. The photoconductive layer has a higher resistivity than the photosensitive member. A barrier layer may be located beneath the photoconductive layer, the barrier layer including either amorphous silicon, oxygen and a Group III impurity or amorphous silicon, carbon and oxygen.

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patent: 4495262 (1985-01-01), Matsuzaki et al.
patent: 4555464 (1985-11-01), Kido et al.

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