Position detecting method and apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356401, G01N 2186

Patent

active

051480379

ABSTRACT:
A method and apparatus for detecting a positional relationship between first and second objects is disclosed, which includes a light source for projecting light to the first and second objects, a photodetecting system for detecting light from one of the first and second objects irradiated with the light from the light source, the detecting system being operable to detect first light whose position of incidence upon a predetermined plane is dependent upon the positional relationship of the first and second objects in a direction along the interval therebetween and in a direction perpendicular to the interval, second light whose position of incidence upon the predetermined plane is dependent upon the positional relationship of the first and second objects in the direction of the interval therebetween, and third light whose position of incidence upon the predetermined plane is independent of the positional relationship of the first and second objects in both the direction of the interval and the direction perpendicular to the interval, and a positional relationship detecting system for detecting the positional relationship of the first and second objects in the direction of the interval and the direction perpendicular to the interval, on the basis of the detection by the photodetecting system.

REFERENCES:
patent: 4037969 (1977-07-01), Feldman et al.
patent: 4326805 (1982-04-01), Feldman et al.
patent: 4360273 (1982-11-01), Thaxter
patent: 4398824 (1983-08-01), Feldman et al.
patent: 4514858 (1985-04-01), Novak
patent: 4539482 (1985-09-01), Nose
patent: 4629313 (1986-12-01), Tanimoto
patent: 4636626 (1987-01-01), Hazama et al.
patent: 4656347 (1987-04-01), Une et al.
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 4904087 (1990-02-01), Harvey et al.
Kinoshita, et al., "A Dual Grating Alignment Technique for X-ray Lithography", J. Vac. Sci. Tech. vol. B1, No. 4, Oct. 1983, pp. 1276-1279.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Position detecting method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Position detecting method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Position detecting method and apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-738194

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.