Electron beam exposure device and exposure method using the same

Details Electron beam exposure device and exposure method using the same Electron beam exposure device and exposure method using the same

1991-10-02

1992-09-15

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

051480336

ABSTRACT:
An electron beam exposure device comprises an electron gun, a mask plate provided with a plurality of apertures defining corresponding patterns, each pattern having a specific shape for forming a corresponding cross-sectional shape of an electron beam composed of charged particles incident thereon and passing therethrough, deflecting means provided both on a first side of a mask plate onto which the beam is irradiated and on a second side thereof from which the beam is emitted, for deflecting the beam from an original axis thereof so as to pass through a selected one of the apertures provided on the mask plate, and for deflecting again said beam so as to return said beam to the original axis thereof, sample holding means, focus point adjusting means provided between the mask plate and the sample holding means, and control means for controlling the focus point adjusting means. The focus point adjusting means further comprises processing means for processing focus point adjusting condition data for each specific aperture pattern utilizing a specific relationship between the cross-sectional area of the aperture of each pattern and a specific focus point adjusting value for each pattern, and supplying means for supplying information of said focus point adjusting condition data thus obtained to the focus point adjusting means.

REFERENCES:
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4968893 (1990-01-01), Yasuda et al.
H. C. Pfeiffer IEEE Transactions on Electron Devices vol. ED-26 No. 4, Apr., 1979, pp. 663-674.

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