Method of cleaning a surface

Details Method of cleaning a surface Method of cleaning a surface

1990-10-30

1992-09-15

Simmons, David A.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

156643, 156646, 156668, H01L 2100

Patent

active

051474654

ABSTRACT:
A method of cleaning a surface including generating helium ions, electrons, and metastable helium by exciting helium gas, separating said metastable helium from the helium ions and electrons, and exposing a substance to be processed on the surface of which foreign matter is present to the metastable helium separated from the helium ions and electrons to remove the foreign matter from the substance.

REFERENCES:
patent: 3673071 (1972-06-01), Pritchard et al.
patent: 3983264 (1976-09-01), Schroen et al.
patent: 4244799 (1981-01-01), Fraser et al.
patent: 4711698 (1987-12-01), Douglas
patent: 4795717 (1989-01-01), Okamura
patent: 4831963 (1989-05-01), Saito et al.
patent: 4863561 (1989-09-01), Freeman et al.
patent: 5002632 (1991-03-01), Loewenstein et al.
Ikawa et al, "Si Surface Treatment Using Deep UV Irradiation", 1985 Dry Process Symposium, NEC Corporation, pp. 25-29.
Irino et al, "The Removal Method of Carbon Contamination By R.I.E.", Applied Physics Society, 1987, p. 562.

Affiliated with

Also associated with

Rating

Method of cleaning a surface does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of cleaning a surface, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of cleaning a surface will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-733800