Silicon barrier Josephson junction configuration

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29589, 29590, 29599, 357 5, B01J 1700

Patent

active

042532302

ABSTRACT:
A planar, silicon barrier, Josephson junction and method of forming the jtion which does not require expensive high-resolution, lithography techniques such as electron beam or x-ray. The method includes an etching mask-etch process which forms the basic structure configuration using a (110)-cut silicon wafer. Subsequent to the etching process the mask is removed and a superconducting film is deposited on the previously formed silicon surface to produce a single crystal silicon barrier with good electrical properties.

REFERENCES:
patent: 3522492 (1970-08-01), Pierce
patent: 3911333 (1975-10-01), Notarys
patent: 4025844 (1977-05-01), Deutscher
patent: 4064029 (1977-12-01), Wu

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