Positive type photosensitive quinone diazide phenolic resin comp

Details Positive type photosensitive quinone diazide phenolic resin comp Positive type photosensitive quinone diazide phenolic resin comp

1993-03-19

1994-11-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03F 7023

Patent

active

053689771

ABSTRACT:
A positive type photosensitive resin composition contains (a) a quinone diazido phenolic resin represented by the formula: ##STR1## wherein R.sup.1 is an alkyl group having 1 to 4 carbon atoms, R.sup.2 is a bivalent hydrocarbon residue having 5 to 16 carbon atoms provided that groups bound to R.sup.2 do not bind with the same carbon atom of R.sup.2, D.sup.1, D.sup.2 and D.sup.3 and are the same or different groups and each represent a hydrogen atom or a quinone diazido unit represented by ##STR2## provided that a molar ratio of the hydrogen atom to the quinone diazido unit is 0 to 10, m is a number of 0 to 10, n is a number of 1 or 2, and l.sub.1, l.sub.2 and l.sub.3 are the same or different numbers and each represent a number of 1 to 3; and (b) an alkali-soluble resin.

REFERENCES:
patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5178986 (1993-01-01), Zampini et al.

Affiliated with

Also associated with

Rating

Positive type photosensitive quinone diazide phenolic resin comp does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive type photosensitive quinone diazide phenolic resin comp, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photosensitive quinone diazide phenolic resin comp will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-73265