Process for performing low wavelength photolithography on semico

Details Process for performing low wavelength photolithography on semico Process for performing low wavelength photolithography on semico

1995-08-28

1997-09-09

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 71, 355 77, 430966, 378 34, G03B 2742

Patent

active

056661894

ABSTRACT:
Fine, sub-micron line features and patterns are created in a sensitized layer on a semiconductor wafer by a beam of low wavelength radiation, such as X-rays or Gamma-rays. A stream of such radiation is concentrated and collimated by a concentrator, the output of which is disposed in close proximity to the sensitized surface of the wafer. In this manner, the sensitized surface can be converted from one chemical state to another chemical state, essentially point-by-point. By moving one or the other of the beam or the wafer, line features can be converted in the sensitized surface. Typically, non-converted areas of the sensitized surface are removed, for further processing a layer underlying the sensitized surface. The concentrator is useful in for directing a stream of radiation from a continuously emitting source, such as from a pellet of Cobalt-60, onto the sensitized surface of the wafer when a shutter mechanism is incorporated either upstream (towards the source) or downstream (towards the wafer) from the concentrator.

REFERENCES:
patent: 3436353 (1969-04-01), Dreyer et al.
patent: 3441346 (1969-04-01), Naidich et al.
patent: 3598471 (1971-08-01), Baldwin et al.
patent: 3680956 (1972-08-01), Custer
patent: 3758207 (1973-09-01), Letzer
patent: 4025191 (1977-05-01), Seward, III
patent: 4316074 (1982-02-01), Daly
patent: 4541712 (1985-09-01), Whitney
patent: 4796038 (1989-01-01), Allen et al.
patent: 5055871 (1991-10-01), Pasch
patent: 5139904 (1992-08-01), Auda et al.
patent: 5245384 (1993-09-01), Mori
patent: 5363170 (1994-11-01), Muraki
patent: 5485243 (1996-01-01), Rostoker et al.
Kingslake, Rudolf; "Optical System Design" (New York, Academic Press, 1982) pp. 73-74, 221-223.

Affiliated with

Also associated with

Rating

Process for performing low wavelength photolithography on semico does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for performing low wavelength photolithography on semico, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for performing low wavelength photolithography on semico will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-73237