Silicon oxime film

Details Silicon oxime film Silicon oxime film

1995-06-07

1998-01-20

Bowers, Jr., Charles L.

Fishing, trapping, and vermin destroying

437241, 427574, 427579, 423325, 257632, 257649, H01L 21316

Patent

active

057100675

ABSTRACT:
A silicon oxime film is formed by plasma enhanced chemical vapor deposition. The silicon oxime film is useful as an anti-reflection layer during photolithography, as an etch stop, and as a protection layer.

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