Vacuum coating system

Details Vacuum coating system Vacuum coating system

1995-06-02

1996-07-23

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429825, 20429834, 20429835, C23C 1434

Patent

active

055386105

ABSTRACT:
A vacuum coating system has a processing station (2) designed as a sputter-etching station, in which a high-frequency input electrode (25) is mounted between two substrate holders (23, 24), which carry the substrates (5, 6). Between the substrate holders (23, 24) and the high-frequency input electrode (25), a distance (a) is provided, which is smaller than the dark space distance.

REFERENCES:
patent: 3787312 (1974-01-01), Wagner et al.
patent: 4194962 (1980-03-01), Chambers et al.
patent: 4593644 (1986-02-01), Hanak
patent: 5133285 (1992-10-01), Mahler et al.
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5244559 (1993-09-01), Latz

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