Method for measuring alignment accuracy in a step and repeat sys

Details Method for measuring alignment accuracy in a step and repeat sys Method for measuring alignment accuracy in a step and repeat sys

1996-10-15

1998-11-03

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

356399, 356401, 382145, 382151, G03F 900

Patent

active

058306102

ABSTRACT:
A method for measuring alignment accuracy in a step and repeat system which includes projecting an array of rows and columns of grating features onto a wafer coated with a resist using a first stepping distance and using an increased exposure dosage from row to row of said array; projecting the same array over the first but using a different stepping distance along the rows and also a sufficient offset in the starting positions of the first and second exposures to form a phase difference between the two projection exposures which will result in a complementary alignment of the two exposures at least one column in the array.

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