Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1998-05-19
2000-02-29
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510176, 510178, 510201, 510202, 510203, 510204, 510210, 510212, 510245, 510254, 510255, 510256, 510257, 510259, 510412, 510477, 510480, 510504, C11D 162, C11D 330, C11D 324, C11D 708
Patent
active
060309326
ABSTRACT:
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.
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Honda Kenji
Leon Vincent G.
Rothgery Eugene F.
Boyer Charles
Gupta Yogendra
Olin Microelectronic Chemicals
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