Process for the production of finely divided oxides

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423337, 423592, 423608, 423612, 423613, 423625, 423632, 423633, C01B 3312, C01F 702, C01G 4902, C01G 2306

Patent

active

039549453

ABSTRACT:
Process for the production of a finely divided oxide of a metal or silicon by the hydrolytic conversion of a volatile corresponding metal halide or silicon halide in a flame, said process comprising feeding the volatile halide in a mixture with a combustible hydrogen-containing gas and air or oxygen to a burner provided with a mouth emitting a flame, burning the mixture in a fire tube to form a first portion of water vapor, said burner surrounded by an annular chamber forming a nozzle through which hydrogen is passed to keep the mouth of the burner free of attachments of solid substances, the quantity of oxygen or air being sufficient for the practically complete combustion of the combustible gas, and the quantities of oxygen or air and combustible gas being sufficient to produce the first portion of water vapor which will at least suffice for the hydrolysis of the volatile halides, and further wherein said flame is allowed to burn in an atmosphere consisting of gases containing a second portion of water vapor, to avoid the formation of halogen gas in waste gases and separating the resulting oxide from other reaction products. The finely divided oxides are useful as additives and fillers in the manufacture of coatings, adhesives and elastomers.

REFERENCES:
patent: 2990249 (1961-06-01), Wagner
patent: 3468689 (1969-09-01), Lott, Jr. et al.
patent: 3567478 (1971-03-01), Dietz et al.

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