Plasma CVD apparatus

Details Plasma CVD apparatus Plasma CVD apparatus

1985-01-16

1987-01-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118 501, C23C 1308

Patent

active

046338110

ABSTRACT:
In the particular embodiments described in the specification, a plasma CVD apparatus has a plurality of pairs of electrodes and equal discharges are attained by controlling the power supplied to the high frequency electrodes independently of one another so as to effect the formation of uniform films. Electromagnetic mutual interference between the electrodes is reduced by allowing the high frequency power supplies for supplying the power to function independently and providing a phase regulator if necessary.

REFERENCES:
patent: 4292153 (1981-09-01), Kudo et al.
patent: 4381965 (1983-05-01), Maher, Jr. et al.
patent: 4464223 (1984-08-01), Gorin
patent: 4478173 (1984-10-01), Doehler
patent: 4500563 (1985-02-01), Ellenberger et al.

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